Tyndall researchers produce first ever atom-by-atom simulation of ALD nanoscale film growth

Researchers at Tyndall National Institute, Ireland, have produced the first ever atom-by-atom simulation of nanoscale film growth by atomic layer deposition (ALD) – a thin-film technology used in the production of silicon chips.

Fuente : http://www.alphagalileo.org/ViewItem.aspx?ItemId=1...